General Properties  특성

•  Highly soluble in BOE solutions
•  Improved wetting
•  Filterable
•  Low effective concentrations
•  Little or no effect on the etch rate
•  Limited surface adsorption
•  Low metals

Applications  용도

•  Photoresist
    : Developer, Stripper,
    : Edge bead removers
    : Anti-reflective coatings
•  BOE (Buffered Oxide Etch)                                                    
•  BHF (Buffered HF Solutions)